Hard film and its manufacturing method



PROBLEM TO BE SOLVED: To provide a hard film particularly having excellent wear resistance by the increase of its hardness without sacrificing the characteristics of chipping resistance and lubricity therein, and to provide its manufacturing method. SOLUTION: The hard film has a composition comprising S and one or more metallic elements selected from the group 4a, 5a, 6a metals, Al, B, and Si, and one or more nonmetallic elements selected from C, N and O. The hard film has a columnar structure. Each crystal grain in the columnar structure has a multilayer structure having a componential difference in the S content, a region in which at least crystal lattice streaks are continued is present in the boundary region between the layers in the multilayer structure, the thickness T (nm) of each layer satisfies 0.1≤T≤100, and, provided that the peak intensity of the (200) plane by X-ray diffraction is defined as Ib and the peak intensity of the (111) plane as Ia, the peak intensity ratio Ib/Ia satisfies Ib/Ia≤1.0. The manufacturing method uses the same. COPYRIGHT: (C)2007,JPO&INPIT
【課題】硬質皮膜の耐欠損性、潤滑性の特性を犠牲にすることが無く、特に高硬度化による優れた耐摩耗性を有する硬質皮膜を提供することとその製造方法を提供する。 【解決手段】硬質皮膜は、4a、5a、6a族、Al、B、Siから選択される1種以上の金属元素と、Sを含みC、N、Oから選択される1種以上の非金属元素によって構成され、該硬質皮膜は柱状組織構造を有し、該柱状組織構造の結晶粒はS成分に組成差を有する多層構造を有し、少なくとも該多層構造における層間の境界領域で結晶格子縞が連続している領域があり、各層の厚みT(nm)が0.1≦T≦100、X線回折による(200)面のピーク強度をIb、(111)面のピーク強度をIaとしたとき、そのピーク強度比Ib/Iaは、Ib/Ia≦1.0であることを特徴とする硬質皮膜及びその製造方法である。 【選択図】図1




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    JP-2005226102-AAugust 25, 2005Hitachi Tool Engineering Ltd, 日立ツール株式会社硬質皮膜及び硬質皮膜被覆工具

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